Etching results and comparison of low pressure electron cyclotron resonance and radio frequency discharge sources.

Autor: Cook, J. M., Ibbotson, D. E., Foo, P. D., Flamm, D. L.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1990, Vol. 8 Issue 3, p1820-1824, 5p
Databáze: Complementary Index