X-ray photoelectron spectroscopy investigation on the chemical structure of amorphous silicon nitride (a-SiNx).
| Autor: | Ingo, G. M., Zacchetti, N., della Sala, D., Coluzza, C. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1989, Vol. 7 Issue 5, p3048-3055, 8p |
| Databáze: | Complementary Index |
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