Effect of oxygen on fluorine-based remote plasma etching of silicon and silicon dioxide.
| Autor: | Loewenstein, Lee M. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1988, Vol. 6 Issue 3, p1984-1988, 5p |
| Databáze: | Complementary Index |
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