Chemically enhanced ion etching on refractory metal silicides.

Autor: O'Brien, W. L., Rhodin, T. N., Rathbun, L. C.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1988, Vol. 6 Issue 3, p1384-1387, 4p
Databáze: Complementary Index