Chemically enhanced ion etching on refractory metal silicides.
Autor: | O'Brien, W. L., Rhodin, T. N., Rathbun, L. C. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1988, Vol. 6 Issue 3, p1384-1387, 4p |
Databáze: | Complementary Index |
Externí odkaz: |