High rate sputtering deposition of nickel using dc magnetron mode.
Autor: | Chang, S. A., Skolnik, M. B., Altman, C. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1986, Vol. 4 Issue 3, p413-416, 4p |
Databáze: | Complementary Index |
Externí odkaz: |