Methylated poly(4-hydroxystyrene): A new resin for deep-ultraviolet resist application.

Autor: McKean, Dennis R., Hinsberg, William D., Sauer, Thomas P., Willson, Grant, Vicari, Richard, Gordon, Douglas J.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1466-1469, 4p
Databáze: Complementary Index