Parametric modeling of focused ion beam induced etching.
| Autor: | Gandhi, Anil, Orloff, Jon |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1814-1819, 6p |
| Databáze: | Complementary Index |
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