Application of a low-pressure radio frequency discharge source to polysilicon gate etching.
| Autor: | Cook, J. M., Ibbotson, D. E., Flamm, D. L. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 1, p1-4, 4p |
| Databáze: | Complementary Index |
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