Approaches to deep ultraviolet photolithography utilizing acid hardened resin photoresist systems.
| Autor: | Thackeray, James W., Orsula, George W., Bohland, John F., McCullough, Andrew W. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 6, p1620-1623, 4p |
| Databáze: | Complementary Index |
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