Synthesis and characterization of an organogermanium resist: Poly(trimethylgermylmethyl methacrylate-co-chloromethylstyrene).

Autor:	Mixon, D. A., Novembre, A. E.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 6, p1723-1728, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu