Strain relaxation kinetics in Si1-xGex/Si heterostructures.
| Autor: | Hauenstein, R. J., Clemens, B. M., Miles, R. H., Marsh, O. J., Croke, E. T., McGill, T. C. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 4, p767-774, 8p |
| Databáze: | Complementary Index |
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