X-ray spectra in a gas puff plasma x-ray source for x-ray lithography.
| Autor: | Itabashi, Seiichi, Okada, Ikuo, Saitoh, Yasunao, Yoshihara, Hideo |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 4, p633-639, 7p |
| Databáze: | Complementary Index |
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