Mechanistic studies of oxygen plasma etching.

Autor:	Hartney, M. A., Greene, W. M., Soane, D. S., Hess, D. W.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 6, p1892-1895, 4p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu