Characterization of etching of silicon dioxide and photoresist in a fluorocarbon plasma.
| Autor: | Karulkar, Pramod C., Wirzbicki, Mark A. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 5, p1595-1599, 5p |
| Databáze: | Complementary Index |
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