Photoreflectance surface Fermi level measurements of GaAs subjected to various chemical treatments.
| Autor: | Gaskill, D. K., Bottka, N., Sillmon, R. S. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 5, p1497-1501, 5p |
| Databáze: | Complementary Index |
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