A Monte Carlo microtopography model for investigating plasma/reactive ion etch profile evolution.
| Autor: | Cotler, Tina J., Barnes, Michael S., Elta, Michael E. |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 2, p542-550, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|