Oxygen contamination of Ge during thermal evaporation for Ohmic contacts to GaAs.
Autor: | Moshier, W. C., Tu, D.-W., Davis, G. D. |
---|---|
Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 2, p582-583, 2p |
Databáze: | Complementary Index |
Externí odkaz: |