A practical interferometric technique for mask/wafer alignment during proximity printing.
| Autor: | Bartelt, John L., Olney, Ross D. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 1, p413-416, 4p |
| Databáze: | Complementary Index |
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