Plasma assisted chemical vapor deposited thin films for microelectronic applications.
Autor: | Nguyen, S. V. |
---|---|
Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1986, Vol. 4 Issue 5, p1159-1167, 9p |
Databáze: | Complementary Index |
Externí odkaz: |