Plasma assisted chemical vapor deposited thin films for microelectronic applications.
| Autor: | Nguyen, S. V. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1986, Vol. 4 Issue 5, p1159-1167, 9p |
| Databáze: | Complementary Index |
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