Ion beam etching of InGaAs, InP, GaAs, Si, and Ge.
| Autor: | Chen, Wei-Xi, Walpita, L. M., Sun, C. C., Chang, W. S. C. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1986, Vol. 4 Issue 3, p701-705, 5p |
| Databáze: | Complementary Index |
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