Self-aligned dual surface lithography.
| Autor: | Krusius, J. P., Nulman, J., Perera, A. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1986, Vol. 4 Issue 1, p369-374, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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