Safety considerations for plasma aluminum etching.
| Autor: | Corn, Glenn, Baldwin, David G. |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 3, p909-912, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|