Masked ion beam resist exposure using grid support stencil masks.
| Autor: | Randall, J. N., Flanders, D. C., Economou, N. P., Donnelly, J. P., Bromley, E. I. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 1, p58-61, 4p |
| Databáze: | Complementary Index |
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