New, deep UV resist (LMR) for lift-off technique.
| Autor: | Yamashita, Yoshio, Kawazu, Ryuzi, Kawamura, Kazutami, Ohno, Seigo, Asano, Takateru, Kobayashi, Kenji, Nagamatsu, Gentaro |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 1, p314-318, 5p |
| Databáze: | Complementary Index |
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