Selective and anisotropic reactive ion etch of LPCVD silicon nitride with CHF3 based gases.
| Autor: | Mele, T. C., Nulman, J., Krusius, J. P. |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1984, Vol. 2 Issue 4, p684-687, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|