Nitrocellulose as a self-developing resist with submicrometer resolution and processing stability.

Autor:	Geis, M. W., Randall, J. N., Deutsch, T. F., Efremow, N. N., Donnelly, J. P., Woodhouse, J. D.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1983, Vol. 1 Issue 4, p1178-1181, 4p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu