Contact lithography at 157 nm with an F2 excimer laser.
| Autor: | Craighead, H. G., White, J. C., Howard, R. E., Jackel, L. D., Behringer, R. E., Sweeney, J. E., Epworth, R. W. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1983, Vol. 1 Issue 4, p1186-1189, 4p |
| Databáze: | Complementary Index |
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