Advanced photolithographic mask repair using electron beams.
| Autor: | Liang, Ted, Frendberg, Eric, Lieberman, Barry, Stivers, Alan |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2005, Vol. 23 Issue 6, p3101-3105, 5p |
| Databáze: | Complementary Index |
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