Strain analysis in silicon substrates under uniaxial and biaxial stress by convergent beam electron diffraction.
Autor: | Toh, Suey Li, Loh, K. P., Boothroyd, C. B., Li, K., Ang, C. H., Chan, L. |
---|---|
Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2005, Vol. 23 Issue 3, p940-946, 7p |
Databáze: | Complementary Index |
Externí odkaz: |