Chamber maintenance and fault detection technique for a gate etch process via self-excited electron resonance spectroscopy.
| Autor: | Baek, Kye Hyun, Jung, Youngjae, Min, Gyung Jin, Kang, Changjin, Cho, Han Ku, Moon, Joo Tae |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2005, Vol. 23 Issue 1, p125-129, 5p |
| Databáze: | Complementary Index |
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