Liquid immersion lithography: Why, how, and when?
| Autor: | Rothschild, M., Bloomstein, T. M., Kunz, R. R., Liberman, V., Switkes, M., Palmacci, S. T., Sedlacek, J. H. C., Hardy, D., Grenville, A. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 6, p2877-2881, 5p |
| Databáze: | Complementary Index |
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