Initial lithography results from the digital electrostatic e-beam array lithography concept.
| Autor: | Baylor, L. R., Gardner, W. L., Yang, X., Kasica, R. J., Guillorn, M. A., Blalock, B., Cui, H., Hensley, D. K., Islam, S., Lowndes, D. H., Melechko, A. V., Merkulov, V. I., Joy, D. C., Rack, P. D., Simpson, M. L., Thomas, D. K. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 6, p3021-3024, 4p |
| Databáze: | Complementary Index |
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