Nonaqueous development of silsesquioxane electron beam resist.

Autor: Schmid, Gerard M., Carpenter, Leslie E., Liddle, J. Alexander
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 6, p3497-3502, 6p
Databáze: Complementary Index