Nonaqueous development of silsesquioxane electron beam resist.
Autor: | Schmid, Gerard M., Carpenter, Leslie E., Liddle, J. Alexander |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 6, p3497-3502, 6p |
Databáze: | Complementary Index |
Externí odkaz: |