Diffusion and Permeation of He, Ne, Ar, Kr, and D2 through Silicon Oxide Thin Films.
| Autor: | Perkins, W. G., Begeal, D. R. |
|---|---|
| Zdroj: | Journal of Chemical Physics; Feb1971, Vol. 54 Issue 4, p1683-1694, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Perkins, W. G., Begeal, D. R. |
|---|---|
| Zdroj: | Journal of Chemical Physics; Feb1971, Vol. 54 Issue 4, p1683-1694, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|