The thin-film formation of rhodium silicides.
| Autor: | Petersson, S., Anderson, R., Baglin, J., Dempsey, J., Hammer, W., d'Heurle, F., LaPlaca, S. |
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| Zdroj: | Journal of Applied Physics; Jan1980, Vol. 51 Issue 1, p373-382, 10p |
| Databáze: | Complementary Index |
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