Measurements of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si.
Autor: | Rossington, C., Evans, A. G., Marshall, D. B., Khuri-Yakub, B. T. |
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Zdroj: | Journal of Applied Physics; Nov1984, Vol. 56 Issue 10, p2639-2644, 6p |
Databáze: | Complementary Index |
Externí odkaz: |