Measurements of adherence of residually stressed thin films by indentation. II. Experiments with ZnO/Si.

Autor: Rossington, C., Evans, A. G., Marshall, D. B., Khuri-Yakub, B. T.
Zdroj: Journal of Applied Physics; Nov1984, Vol. 56 Issue 10, p2639-2644, 6p
Databáze: Complementary Index