Structural and chemical analysis of ion beam produced conductive regions on highly resistive organic films.

Autor: Venkatesan, T., Forrest, S. R., Kaplan, M. L., Schmidt, P. H., Murray, C. A., Brown, W. L., Wilkens, B. J., Roberts, R. F., Rupp, L., Schonhorn, H.
Zdroj: Journal of Applied Physics; Nov1984, Vol. 56 Issue 10, p2778-2787, 10p
Databáze: Complementary Index