Structural and chemical analysis of ion beam produced conductive regions on highly resistive organic films.
Autor: | Venkatesan, T., Forrest, S. R., Kaplan, M. L., Schmidt, P. H., Murray, C. A., Brown, W. L., Wilkens, B. J., Roberts, R. F., Rupp, L., Schonhorn, H. |
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Zdroj: | Journal of Applied Physics; Nov1984, Vol. 56 Issue 10, p2778-2787, 10p |
Databáze: | Complementary Index |
Externí odkaz: |