Plasmaless dry etching of silicon with fluorine-containing compounds.
| Autor: | Ibbotson, D. E., Mucha, J. A., Flamm, D. L., Cook, J. M. |
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| Zdroj: | Journal of Applied Physics; Nov1984, Vol. 56 Issue 10, p2939-2942, 4p |
| Databáze: | Complementary Index |
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