X-ray diffraction study and electrical characterization of boron-implanted low-pressure chemical vapor deposited polycrystalline silicon layers.
| Autor: | Hendriks, M., Delhez, R., de Keijser, Th. H., Radelaar, S., Habraken, F. H. P. M., Kuiper, A. E. T., Boudewijn, P. R. |
|---|---|
| Zdroj: | Journal of Applied Physics; Nov1984, Vol. 56 Issue 10, p2751-2761, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|