Breakdown of thin films 'cured' with tantalum oxide.
Autor: | Brekhunov, V., Motoshkin, V., Mukhachev, V. |
---|---|
Zdroj: | Soviet Physics Journal; 1977, Vol. 20 Issue 4, p523-526, 4p |
Abstrakt: | Studies have been made of the temperature and time characteristics of breakdown in a thin TaO film produced by reactive evaporation with subsequent 'curing' of the defect sites, with aluminum electrodes. The data obtained are explained from the viewpoint of classical thermal breakdown. [ABSTRACT FROM AUTHOR] |
Databáze: | Complementary Index |
Externí odkaz: |