Breakdown of thin films 'cured' with tantalum oxide.
| Autor: | Brekhunov, V., Motoshkin, V., Mukhachev, V. |
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| Zdroj: | Soviet Physics Journal; 1977, Vol. 20 Issue 4, p523-526, 4p |
| Abstrakt: | Studies have been made of the temperature and time characteristics of breakdown in a thin TaO film produced by reactive evaporation with subsequent 'curing' of the defect sites, with aluminum electrodes. The data obtained are explained from the viewpoint of classical thermal breakdown. [ABSTRACT FROM AUTHOR] |
| Databáze: | Complementary Index |
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