X-ray standing wave microscopy: Chemical microanalysis with atomic resolution.

Autor: Drakopoulos, Michael, Zegenhagen, Jörg, Snigirev, Anatoly, Snigireva, Irina, Hauser, Maik, Eberl, Karl, Aristov, Vitalii, Shabelnikov, Leonid, Yunkin, Vecheslav
Předmět:
Zdroj: Applied Physics Letters; 9/16/2002, Vol. 81 Issue 12, p2279, 3p, 2 Diagrams, 2 Graphs
Abstrakt: We introduce a microprobe technique based on the x-ray standing wave method (XSW) demonstrating that structural analysis can be achieved with chemical sensitivity on a microscopic scale. We apply this XSW microscopy technique to study an epitaxially grown GaAs/Al[sub 0.1] Ga[sub 0.9]As/GaAs(001) heterostructure in cross section. We focus the x-ray beam by a refractive lens onto the cleaved sample and analyze the constituent elements within the 4 µm thick Al[sub 0.1]Ga[sub 0.9]As layer resolving the substitutional location of Al. The new micro-XSW technique will permit microscopic examinations of the structure of integrated semiconductor devices or microscopic crystalline grains with chemical sensitivity and structural resolution on the pm scale. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index