Growth of Diamond Films on Crystalline Silicon by Hot-Filament Chemical Vapor Deposition.

Autor: Baıdakova, M. V., Vul’, A. Ya., Golubev, V. G., Grudinkin, S. A., Melekhin, V. G., Feoktistov, N. A., Krüger, A.
Předmět:
Zdroj: Semiconductors; Jun2002, Vol. 36 Issue 6, p615, 6p
Abstrakt: The effect of hot-filament chemical vapor deposition conditions on the phase composition of diamond films grown on a silicon substrate was studied. The growth conditions providing the highest content of diamond phase at a growth rate of about 1 µm/h were ascertained. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index