Chemical sputtering yields of silicon resulting from F+, CFn+ (n = 1,2,3) ion bombardment.
| Autor: | Miyake, Kiyoshi, Tachi, Shin'ichi, Yagi, Kunihiro, Tokuyama, Takashi |
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| Zdroj: | Journal of Applied Physics; Apr1982, Vol. 53 Issue 4, p3214-3219, 6p |
| Databáze: | Complementary Index |
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