Multilevel Si doping in GaAs using a single AsCl3:SiCl4 doping source.

Autor: Eu, V., Feng, M., Zielinski, T., Whelan, J. M.
Zdroj: Journal of Applied Physics; Feb1982, Vol. 53 Issue 2, p1266-1268, 3p
Databáze: Complementary Index