Multilevel Si doping in GaAs using a single AsCl3:SiCl4 doping source.
Autor: | Eu, V., Feng, M., Zielinski, T., Whelan, J. M. |
---|---|
Zdroj: | Journal of Applied Physics; Feb1982, Vol. 53 Issue 2, p1266-1268, 3p |
Databáze: | Complementary Index |
Externí odkaz: |