The implication of flow-rate dependencies in plasma etching.
| Autor: | Chapman, B. N., Hansen, T. A., Minkiewicz, V. J. |
|---|---|
| Zdroj: | Journal of Applied Physics; Jul1980, Vol. 51 Issue 7, p3608-3613, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Chapman, B. N., Hansen, T. A., Minkiewicz, V. J. |
|---|---|
| Zdroj: | Journal of Applied Physics; Jul1980, Vol. 51 Issue 7, p3608-3613, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|