Auger electron and x-ray photoelectron spectroscopy of sputter deposited aluminum nitride.

Autor: Kovacich, J. A., Kasperkiewicz, J., Lichtman, D., Aita, C. R.
Zdroj: Journal of Applied Physics; Apr1984, Vol. 55 Issue 8, p2935-2939, 5p
Databáze: Complementary Index