Infrared rapid thermal annealing for GaAs device fabrication.
| Autor: | Kohzu, H., Kuzuhara, M., Takayama, Y. |
|---|---|
| Zdroj: | Journal of Applied Physics; Sep1983, Vol. 54 Issue 9, p4998-5003, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Kohzu, H., Kuzuhara, M., Takayama, Y. |
|---|---|
| Zdroj: | Journal of Applied Physics; Sep1983, Vol. 54 Issue 9, p4998-5003, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|