Electron microscopy studies of pulsed electron beam annealing in phosphorus-implanted silicon.
| Autor: | Tholomier, M., Pitaval, M., Ambri, M., Barbier, D., Laugier, A. |
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| Zdroj: | Journal of Applied Physics; Mar1983, Vol. 54 Issue 3, p1588-1594, 7p |
| Databáze: | Complementary Index |
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