Metastable doping behavior in antimony-implanted (100) silicon.
| Autor: | Williams, J. S., Short, K. T. |
|---|---|
| Zdroj: | Journal of Applied Physics; Dec1982, Vol. 53 Issue 12, p8663-8667, 5p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Williams, J. S., Short, K. T. |
|---|---|
| Zdroj: | Journal of Applied Physics; Dec1982, Vol. 53 Issue 12, p8663-8667, 5p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|